THIN-FILM TECHNOLOGY & NANOENGINEERING

High Vacuum Chamber for Deposition on 2D and 3D substrates

HV Chamber (base pressure: 10-7 Torr) for protective and multifunctional thin films & coatings growth on to 2D and 3D substrates with High-power Impulse Magnetron Sputtering (HIPIMS) and Closed Field Unbalanced Magnetron Sputtering (CFUBMS). Process monitoring via in-situ Multi-Wavelength Spectroscopic Ellipsometry, Optical Emission Spectroscopy and Lagmuire Probe Plasma Diagnostics.

Closed Field DC Unbalanced Magnetron Sputtering

High-power Impulse Magnetron Sputtering

Recent Achievements: Growth of ultra hard protective coatings (Hardness > 50 GPa)

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